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Monday, June 10, 2019

Electrothermal-Chemical Technology


Electrothermal-chemical (ETC) technology is an attempt to increase accuracy and muzzle energy of future tankartillery, and close-in weapon system guns by improving the predictability and rate of expansion of propellants inside the barrel. An electrothermal-chemical gun uses a plasma cartridge to ignite and control the ammunition's propellant, using electrical energy to trigger the process. ETC increases the performance of conventional solid propellants, reduces the effect of temperature on propellant expansion and allows for more advanced, higher density propellants to be used.

The technology has been under development since the mid-1980s and at present is actively being researched in the United States by the Army Research LaboratorySandia National Laboratories and defense industry contractors, including FMC CorporationGeneral Dynamics Land SystemsOlin Ordnance, and Soreq Nuclear Research Center. It is possible that electrothermal-chemical gun propulsion will be an integral part of US Army's future combat system and those of other countries such as Germany and the United Kingdom. ETC technology offers a medium-risk upgrade and is developed to the point that further improvements are so minor that it can be considered mature.

Nevertheless, there is substantial existing evidence that ETC technology is viable and worth the money to continue development. Furthermore, it can be integrated into current gun systems. ETC increases the performance of conventional solid propellants, reduces the effect of temperature on propellant expansion and allows for more advanced, higher density propellants to be used. It will also reduce pressure placed on the barrel in comparison to alternative technologies that offer the same muzzle energy given the fact that it helps spread the propellant's gas much more smoothly during ignition. Currently, there are two principal methods of plasma initiation: the flashboard large area emitter (FLARE) and the triple coaxial plasma igniter (TCPI).

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